The KIWO ScreenSetter Imaging Technology
The basis of the KIWO ScreenSetter is Texas Instrument’s patented DLP technology. In this process, UV light is focused onto a DMD (Digital Micromirror Device), a component with over one million micromirrors. Each of the micromirrors can be digitally controlled - the mirror either projects the light that it receives through an optical lens system or it diverts the light such that the lens does not catch it. This means that each mirror represents a pixel creating an image on the printing screen by exposing the stencil material.

During exposure, the entire imaging unit, including UV-light source, lens system and DLP chip moves across the screen to image the picture elements. Due to the limited number of micromirrors or pixels, only some sections of the image can be projected in one exposure step. These picture segments are joined to form a composite picture by a rapid succession of exposure steps.

Key components of the KIWO ScreenSetter are:
• Highest precision optical components
• Modern electronic sensory mechanisms
• Linear motor drive technique
• High precision mechanical engineering
• Powerful software
Digital direct exposure of the screen with UV-light eliminates the masking process (film positives) by exposing only those areas of the screen that need to receive light, leaving the image area unexposed. After exposure the screen is developed with water as usual. The resulting screen features optimal image quality typically superior to conventional screen imaging.

KIWO ScreenSetter Brochure
The KIWO ScreenSetter is the only digital direct exposure system utilizing high power wide spectrum UV-Light. Advantages of digital direct exposure with the KIWO ScreenSetter include:
• Unsurpassed image quality with 1500 dpi resolution
• Fast exposure process
• Highest accuracy in image placement and image dimensions
• Shortest workflow in screen printing
• No consumables required
The KIWO ScreenSetter sets a new standard in Computer-To-Screen imaging. More...
The KIWO ScreenSetter Model selection offers the right configuration for the most applications. Custom solutions include multiple frame holder systems, custom pin registration and other design frame holder variations. Click on thepdf icon below to see the specifications of each model or the description of the frame holder.
Model |
Description |
Exposure system with dual imaging head |
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Variable frame holder max 1090 x 1250 mm frame OD and a maximum profile thickness of 51mm (2") Max 940 x 1100 mm exposure area |
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Exposure system with single |
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Variable frame holder max 1000 x 950 mm frame OD Max. profile thickness of 51mm (2") |
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For CD frames with 4-up frame holder and vacuum bed for exposure of 4 CD offset plates |
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For CD frames with 6-up frame holder |